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This scarce antiquarian book is a facsimile reprint of the original. Due to its age, it may contain imperfections such as marks, notations, marginalia and flawed pages. Because we believe this work is culturally important, we have made it available as part of our commitment for protecting, preserving, and promoting the world's literature in affordable, high quality, modern editions that are true to the original work.
As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography and multibeam electron beam lithography. These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches. This book therefore aims to bring together the worlds foremost resist development scientists from the various community to produce in one place a definitive description of the many approaches to lithography fabrication.Assembles up-to-date information from the world''s premier resist chemists and technique development lithographers on the properties and capabilities of the wide range of resist materials currently under investigationIncludes information on processing and metrology techniquesBrings together multiple approaches to litho pattern recording from academia and industry in one place
This 1971 volume selects some of the most important papers which were delivered during the 1960s in the Cambridge Conferences on Development, and presents them as a contribution to the discussion on how economic development could best be planned and advanced for the Third World. This book is a valuable contribution to making poor countries richer.
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