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Design a Slit HDP Semiconductor Plasma Dry Etcher

Bag om Design a Slit HDP Semiconductor Plasma Dry Etcher

In order to overcome the difficulties of the manufacturing procedures, the novel concept of slit shape HDP plasma dry etching of metal roller from semiconductor IC process is proposed and applied to a patent.

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  • Sprog:
  • Engelsk
  • ISBN:
  • 9798561298431
  • Indbinding:
  • Paperback
  • Sideantal:
  • 140
  • Udgivet:
  • 8. november 2020
  • Størrelse:
  • 152x229x8 mm.
  • Vægt:
  • 195 g.
  • BLACK WEEK
  Gratis fragt
Leveringstid: 2-3 uger
Forventet levering: 14. december 2024

Beskrivelse af Design a Slit HDP Semiconductor Plasma Dry Etcher

In order to overcome the difficulties of the manufacturing procedures, the novel concept of slit shape HDP plasma dry etching of metal roller from semiconductor IC process is proposed and applied to a patent.

Brugerbedømmelser af Design a Slit HDP Semiconductor Plasma Dry Etcher



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