Developments in Photoelasticity

In recent years, the field of digital photoelasticity has begun to stabilise. Developments in Photoelasticity presents, in one volume, the time-tested advancements that have brought about a fundamental change in employing photoelastic analysis to solve diverse applications. Based on decades of active research, this authoritative treatment surveys wide-ranging connections in the field, focusing on developments made since 2010. Wide-ranging in its application, this high-level reference text is an invaluable tool for stress analysts, teachers of photo-mechanics and industry practitioners involved in stress analysis, solid mechanics, fracture mechanics, glass stress analysis, and contact mechanics. It also serves as a link between active research and teaching at graduate and senior undergraduate level.

Key Features:

Establishes the basics of photoelasticity with clarity to serve as a primary reference for users of the methodologyExplains phase-shifting methods that are robust enough to allow the reader to implement them with ease.Explores modern methods based on colour information processing using a single isochromatic image as well as use of conventional polariscopes for complete photoelastic analysis.Provides carrier fringe analysis tools for quantifying low stress field information for special applications.Extensive information on a variety of applications of photoelasticity covering domains ranging from biomedical to aerospace to civil engineering applications.Highlights large scale photoelastic studies in granular materials with applications in plant biology, neurobiology and biomimetics